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Characterization of crystallographic defects in homoepitaxial diamond films by synchrotron X-ray topography and cathodoluminescence

机译:同步加速器X射线形貌和阴极发光表征同质外延金刚石膜中的晶体缺陷

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Crystallographic defects in a p-type homoepitaxial diamond film grown by microwave plasma-assisted chemical vapor deposition on a synthetic high-pressure high-temperature type-lb (001) substrate were characterized by synchrotron radiation X-ray diffraction topography (XRT) and cathodoluminescence (CL). CL mapping indicated typical luminescent spots corresponding to the band-A emission around 420 nm. The band-A spots correspond to the spots observed by XRT for both diffraction vectors g = [044] and [404], and are considered to be mixed dislocations with a dislocation direction t = [001]. Typical dislocations in the film, such as edge and perfect 60° dislocations were determined by utilizing the relationship between the diffraction vector g, Burgers vector b, and the dislocation line vector t.
机译:通过同步辐射X射线衍射形貌(XRT)和阴极荧光表征了通过微波等离子体辅助化学气相沉积在合成高压高温Ib(001)衬底上生长的p型同质外延金刚石膜的晶体学缺陷。 (CL)。 CL映射表明典型的发光点对应于420 nm附近的band A发射。带A的斑点对应于对于衍射向量g = [044]和[404]的通过XRT观察到的斑点,并且被认为是位错方向为t = [001]的混合位错。通过利用衍射矢量g,Burgers矢量b和位错线矢量t之间的关系来确定薄膜中的典型位错,例如边缘和60°完美位错。

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