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Hydrogen-vacancy related defect in chemical vapor deposition homoepitaxial diamond films studied by electron paramagnetic resonance and cathodoluminescence

机译:电子顺磁共振和阴极发光研究化学气相沉积同质外延金刚石膜中与氢空位有关的缺陷

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摘要

Hydrogen-vacancy related defect (H1′) in chemical vapor deposition homoepitaxial diamond films has been investigated by electron paramagnetic resonance and cathodoluminescence. It is found that the concentration of H1′ significantly decreases as the dilution (CH4/H2) ratio decreases. It is also confirmed that the intensity of free-exciton emission (Iex) increases as the CH4/H2 ratio decreases. The complementary relationship between Iex and H1′ can be explained by considering that H1′ acts as a nonradiative recombination center which reduces the lifetime of free exciton and Iex. The suppression mechanism of H1′ is discussed by considering the balance between the growth rate and the annihilation rate of H1′ in the subsurface region.
机译:通过电子顺磁共振和阴极发光研究了化学气相沉积同质外延金刚石膜中与氢空位有关的缺陷(H1')。结果发现,随着稀释度(CH4 / H2)的降低,H1'的浓度显着降低。还证实了,自由激子发射强度(Iex)随着CH4 / H2比的降低而增加。 Iex与H1'之间的互补关系可以通过考虑H1'作为非辐射复合中心来解释,这会减少自由激子和Iex的寿命。通过考虑地下区域H1'的生长速率和the灭速率之间的平衡,讨论了H1'的抑制机理。

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