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Defect Analysis of Boron Phosphide Thin Films and Sapphire Single Crystal Using Synchrotron X-ray Topography.

机译:使用同步加速器X射线形貌分析磷化硼薄膜和蓝宝石单晶的缺陷。

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摘要

Boron phosphide is an ideal semiconductor material used for neutron detectors because of its superior material properties, such as wide band gap and large thermal neutron capture cross-section of 10B. Since bulk BP is not readily available for neutron detector application, BP thin films are mainly synthesized by chemical vapor deposition (CVD). Among all the feasible substrates for BP deposition, SiC stands out due to its small lattice mismatch (4.5%) with BP, however it is necessary to optimize the growth condition to synthesize high quality BP thin films on SiC. In chapter III, BP thin film samples deposited on 4H-SiC and 6H-SiC under different growth conditions are characterized, mainly using synchrotron X-ray topography and other techniques such as optical microscopy and scanning electron microscopy. The relationship between BP thin film crystal quality and substrate material and orientation and other growth conditions is investigated. It can be concluded from the experimental data that the crystal quality of BP thin films on 4H-SiC substrate is much better than that on 6H-SiC substrate. Besides, poor crystalline quality of substrate will likely degrade the crystalline quality of epitaxial thin films.;Sapphire single crystal has been widely used in high-technology industry because of its excellent combination between optical, electrical and mechanical properties. In this thesis, a-plane sapphire ribbon grown by Edge-defined Film-fed Growth method (EFG) is analyzed by characterizing the seed crystals used and the quality of as-grown ribbon, by reflection X-ray topography. Distributions and formation mechanisms of defects inside both the sapphire seed crystal and ribbon crystal are studied. Transmission topographs reveal the presence of two sets of slip bands that are nucleated from either edge, the distribution of which is symmetric in the used seed crystal and asymmetric in the pristine seed crystal. This phenomenon could be caused by the unstable growth condition. As in sapphire ribbon, reflection topographs reveal features that indicate interface instability and asymmetric columnar crystal growth near the ribbon shoulder, which eventually lead to polycrystallinity at bottom of the sapphire ribbon.
机译:磷化硼是一种理想的用于中子探测器的半导体材料,因为它具有优异的材料性能,例如宽带隙和10B的大中子俘获截面。由于块状BP不适用于中子探测器应用,因此BP薄膜主要通过化学气相沉积(CVD)合成。在所有可行的BP沉积衬底中,SiC因其与BP的晶格失配小(4.5%)而脱颖而出,但是有必要优化生长条件以在SiC上合成高质量BP薄膜。在第三章中,主要使用同步加速器X射线形貌和其他技术,例如光学显微镜和扫描电子显微镜,对在不同生长条件下沉积在4H-SiC和6H-SiC上的BP薄膜样品进行了表征。研究了BP薄膜晶体质量与衬底材料,取向和其他生长条件之间的关系。从实验数据可以得出结论,BP薄膜在4H-SiC衬底上的晶体质量要好于6H-SiC衬底。此外,基板的不良晶体质量可能会降低外延薄膜的晶体质量。蓝宝石单晶因其在光学,电气和机械性能方面的出色结合而被广泛应用于高科技行业。在本文中,通过反射X射线形貌表征了所使用的晶种和成膜带的质量,从而分析了通过边缘定型膜饲生长法(EFG)生长的a面蓝宝石带。研究了蓝宝石晶种和带状晶体内部缺陷的分布和形成机理。透射形貌图揭示了两组滑移带的存在,该滑移带从任一边缘成核,其分布在使用过的晶种中对称,而在原始晶种中不对称。这种现象可能是由不稳定的生长条件引起的。与蓝宝石带一样,反射形貌图显示的特征表明界面不稳定性和带肩附近的不对称柱状晶体生长,最终导致蓝宝石带底部的多晶性。

著录项

  • 作者

    Ding, Zihao.;

  • 作者单位

    State University of New York at Stony Brook.;

  • 授予单位 State University of New York at Stony Brook.;
  • 学科 Materials science.
  • 学位 M.S.
  • 年度 2014
  • 页码 53 p.
  • 总页数 53
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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