Optimal parameters to produce high quality diamond films on 3D Porous Titanium substrates

摘要

Diamond films grown on three-dimensional (3D) porous titanium substrate were obtained by hot filament chemical vapor deposition (HFCVD) technique. The growth parameters strongly influenced the film properties during this complex film formation process. The pressure inside the reactor as well as the methane concentration showed their influence on the film morphology, quality, and growth rate. The substrates were totally covered by a diamond coating including deeper planes leading to a 3D porous diamond/Ti composite material formation. The sp~2/sp~3 ratio as "purity index" (PI) and the "growth tendency index" (GTI), evaluated from Raman and X-ray spectra respectively, were obtained for these composite materials as a function of their growth parameters.