首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >(001) CeO_2 films epitaxially grown on SrTiO_3 (001) substrates by pulsed laser deposition using a metallic Ce target
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(001) CeO_2 films epitaxially grown on SrTiO_3 (001) substrates by pulsed laser deposition using a metallic Ce target

机译:(001)通过使用金属Ce靶的脉冲激光沉积在SrTiO_3(001)衬底上外延生长的CeO_2膜

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摘要

Cerium dioxide (CeO_2) films have been epitaxially grown on SrTiO_3 (001) substrates by pulsed laser deposition using a metallic Ce target in oxygen ambient. In situ reflection high energy electron diffraction and X-ray diffraction confirm the formation of epitaxial (001) oriented CeO_2 phase. Atomic force microscope and Raman spectra were used to characterize the surface morphologies and the bonding structures of the CeO_2 films. Epitaxial growth of thick CeO_2 films contributes chiefly to a uniform and smooth surface with root mean square roughness of up to 0.272 nm and a high-symmetry F_(2g) mode.
机译:二氧化铈(CeO_2)膜已通过在氧气环境中使用金属Ce靶通过脉冲激光沉积在SrTiO_3(001)衬底上外延生长。原位反射高能电子衍射和X射线衍射证实了外延(001)取向CeO_2相的形成。用原子力显微镜和拉曼光谱表征了CeO_2薄膜的表面形貌和键合结构。厚CeO_2薄膜的外延生长主要有助于形成均匀,光滑的表面,其均方根粗糙度最高可达0.272 nm,并且具有高对称F_(2g)模。

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