(Ag,Li)NbO_3 thin films fabricated on (001), (110), and (111)SrTiO_3 substrates by pulsed laser deposition

机译：（Ag，Li）NBO_3通过脉冲激光沉积（001），（110）和（111）SRTIO_3基板上制造的NBO_3薄膜

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001-, 110-, 111-oriented (Ag_(1-x)Li_x)NbO_3 (ALN) films with x=0.05 (ALN05), 0.1 (ALN10), and 0.15 (ALN15) were fabricated on (001), (110) and (111) SrTiO_3 (STO) substrates by pulse laser deposition (PLD). The surface texture of the ALN films ware dependent on the crystal orientation of STO substrates. All the ALN films exhibited a ferroelectric behavior. The ALN films with x=0.1 deposited on (111) STO showed the largest remanent polarization of 40μC/cm~2.

机译：在（001）上制造了X = 0.05（ALN05），0.1（ALN10），0.1（ALN10）和0.15（ALN15）的001-，110-，111-111型（AG_（1-X）LI_X）NBO_3（ALN）膜，（110通过脉冲激光沉积（PLD）和（111）SRTIO_3（STO）基板（PLD）。 ALN薄膜器件的表面纹理依赖于STO基板的晶体取向。所有ALN薄膜都表现出铁电行为。沉积在（111）STO上的X = 0.1的ALN薄膜显示出40μC/ cm〜2的最大剩余偏振。

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《IEEE International Symposium on Applications of Ferroelectrics》|2013年||共3页
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Yu Yamamoto; Ichiro Fujii; Takahiro Wada;
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中图分类 TM221-53;
关键词
AgNbO_3; LiNbO_3; (Ag; Li)NbO_3; Thin film; Pulsed laser deposition; PLD;

机译：AG NB O_3;Lin BO_3;(A股;l i)n BO_3;thin film;pulse的laser的position;PL D;

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1. Ferroelectric and antiferroelectric properties of AgNbO_3 films fabricated on (001), (110), and (111)SrTiO_3 substrates by pulsed laser deposition [J] . Hiroyuki Sakurai, Seiji Yamazoe, Takahiro Wada Applied Physicsletters . 2010,第4期

机译：通过脉冲激光沉积在（001），（110）和（111）SrTiO_3衬底上制备的AgNbO_3薄膜的铁电和反铁电特性
2. Ferroelectric and antiferroelectric properties of AgNbO3 films fabricated on (001), (110), and (111)SrTiO3 substrates by pulsed laser deposition [J] . Hiroyuki Sakurai Seiji Yamazoe and Takahiro Wada Applied Physics Letteres . 2010,第4期

机译：通过脉冲激光沉积在（001），（110）和（111）SrTiO3衬底上制备的AgNbO3薄膜的铁电和反铁电特性
3. X-ray characterization of LiNbO_3 films grown by pulsed laser deposition on SrTiO_3(100), NdGaO_3(110) and MgO(111) substrates [J] . M. A. Tagliente, L. De Caro, A. Sacchetti, Journal of Crystal Growth . 2000,第1a4期

机译：在SrTiO_3（100），NdGaO_3（110）和MgO（111）衬底上通过脉冲激光沉积生长的LiNbO_3膜的X射线表征
4. (Ag,Li)NbO_3 thin films fabricated on (001), (110), and (111)SrTiO_3 substrates by pulsed laser deposition [C] . Yu Yamamoto, Ichiro Fujii, Takahiro Wada IEEE International Symposium on Applications of Ferroelectrics . 2013

机译：（Ag，Li）NBO_3通过脉冲激光沉积（001），（110）和（111）SRTIO_3基板上制造的NBO_3薄膜
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(Ag,Li)NbO_3 thin films fabricated on (001), (110), and (111)SrTiO_3 substrates by pulsed laser deposition

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