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首页> 外文期刊>Carbon: An International Journal Sponsored by the American Carbon Society >Interfacial electronic structures between fullerene and multilayer graphene for n-type organic semiconducting devices
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Interfacial electronic structures between fullerene and multilayer graphene for n-type organic semiconducting devices

机译:用于n型有机半导体器件的富勒烯与多层石墨烯之间的界面电子结构

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摘要

The interfacial electronic structure of fullerene (C_(60)) deposited on a multilayer graphene (MLG) film was measured using in situ ultraviolet photoelectron spectroscopy and X-ray photoelectron spectroscopy. The energy level alignment at the interface of C_(60)/MLG was estimated by the shifts in the highest occupied molecular orbital (HOMO) and the vacuum level during step-by-step deposition of C_(60) on the MLG. The shift of the HOMO level indicates that there is a small band bending at the interface of C_(60)/MLG. The vacuum level was shifted 0.06 eV toward the low binding energy with additional C_(60) on the MLG. The measurements reveal that the height of the electron injection barrier is 0.59 eV, while the hole injection barrier height is 2.01 eV. We present a complete interfacial energy level diagram for C_(60)/MLG.
机译:使用原位紫外光电子能谱和X射线光电子能谱测量沉积在多层石墨烯(MLG)膜上的富勒烯(C_(60))的界面电子结构。 C_(60)/ MLG界面处的能级排列是通过在CLG(60)上逐步沉积C_(60)时最高占据分子轨道(HOMO)和真空能级的偏移来估计的。 HOMO能级的移动表明在C_(60)/ MLG的界面处有小的带弯曲。真空水平在MLG上通过附加C_(60)向低结合能偏移0.06 eV。测量结果表明,电子注入势垒的高度为0.59 eV,而空穴注入势垒的高度为2.01 eV。我们提供了C_(60)/ MLG的完整界面能级图。

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