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Hystersis Loop Construction for the Metal-Semiconductor Phase Transition in Vanadium Dioxide Films

机译:氧化钒膜中金属-半导体相变的磁滞回线构造

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Thermal hysteresis of the reflectivity of vanadium dioxide films observed upon the metal-semiconductor phase transition s studied. The major hysteresis loop is assumed to form when the phase equilibrium temperature in film grains and the grain size vary and correlate with each other. Within the suggested concept of hysteresis loop formation, it is demonstrated that the major loop may be asymmetric, i.e., broadened (shifted) toward lower temperatures. Unlike hysteresis branches for VO_2 bulk single crystal, those for VO_2 films are extended along the temperature axis and may exhibit a step if the grain size distribution has several maxima. The validity of the concept is verified experimentally. It is also shown that atomic force microscopy (AFM) data for the grain size distribution can serve to determine the distribution parameters from the phase equilibrium temperatures without constructing a complete set of minor hysteresis loops, as was required before.
机译:研究了在金属-半导体相变时观察到的二氧化钒薄膜反射率的热滞后现象。假定当薄膜晶粒的相平衡温度和晶粒尺寸发生变化并相互关联时,就会形成主磁滞回线。在所提出的滞后回线形成的概念内,证明了主回线可能是不对称的,即向较低温度变宽(偏移)。与VO_2块状单晶的磁滞分支不同,VO_2薄膜的磁滞分支沿温度轴延伸,并且如果晶粒尺寸分布具有多个最大值,则可能呈现阶跃。该概念的有效性已通过实验验证。还显示出,用于晶粒尺寸分布的原子力显微镜(AFM)数据可用于从相平衡温度确定分布参数,而无需像以前那样构建完整的次磁滞回线。

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