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10T SRAM Using Half- VDD Precharge and Row-Wise Dynamically Powered Read Port for Low Switching Power and Ultralow RBL Leakage

机译:使用半VDD预充电和行明智动态供电读端口的10T SRAM,具有低开关功率和超低RBL泄漏

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摘要

We present, in this paper, a new 10T static random access memory cell having single ended decoupled read-bitline (RBL) with a 4T read port for low power operation and leakage reduction. The RBL is precharged at half the cell's supply voltage, and is allowed to charge and discharge according to the stored data bit. An inverter, driven by the complementary data node (QB), connects the RBL to the virtual power rails through a transmission gate during the read operation. RBL increases toward the VDD level for a read-1, and discharges toward the ground level for a read-0. Virtual power rails have the same value of the RBL precharging level during the write and the hold mode, and are connected to true supply levels only during the read operation. Dynamic control of virtual rails substantially reduces the RBL leakage. The proposed 10T cell in a commercial 65 nm technology is 2.47× the size of 6T with β = 2, provides 2.3× read static noise margin, and reduces the read power dissipation by 50% than that of 6T. The value of RBL leakage is reduced by more than 3 orders of magnitude and (ION/IOFF) is greatly improved compared with the 6T BL leakage. The overall leakage characteristics of 6T and 10T are similar, and competitive performance is achieved.
机译:我们在本文中介绍了一种新的10T静态随机存取存储单元,该单元具有单端解耦读位线(RBL)和4T读端口,可实现低功耗工作并减少泄漏。 RBL以单元电源电压的一半进行预充电,并根据存储的数据位进行充电和放电。在读取操作期间,由互补数据节点(QB)驱动的反相器通过传输门将RBL连接到虚拟电源轨。对于读1,RBL向VDD电平增加,对于读0,向接地电平放电。虚拟电源轨在写入和保持模式期间具有与RBL预充电电平相同的值,并且仅在读取操作期间才连接至真实电源电平。虚拟导轨的动态控制大大减少了RBL泄漏。在商业65 nm技术中,建议的10T单元的尺寸为6T的2.47倍,β= 2,可提供2.3倍的读取静态噪声容限,并将读取功耗比6T降低50%。与6T BL泄漏相比,RBL泄漏的值减少了3个数量级以上,并且(ION / IOFF)大大提高了。 6T和10T的总体泄漏特性相似,并且可以实现竞争性能。

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