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Performance enhancement of AlGaN-based deep ultraviolet light-emitting diodes by using stepped and super-lattice n-type confinement layer

机译:通过使用阶梯式和超格子N型限制层进行基于Algan基深紫外发光二极管的性能提高

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摘要

In this paper, a new n-type confinement layer that uses the stepped and super-lattice structure to replace conventional n-type AlGaN layer of deep ultraviolet light-emitting diode (DUV LED) is investigated. The simulation results indicate that the new structure significantly enhances the light output power (LOP) and internal quantum efficiency (IQE) of DUV LED. This is because the capability of carrier confinement in the quantum wells (QWs) is enhanced; the carrier concentrations and the radiative recombination rate in the active region of DUV LED are improved.
机译:本文研究了使用阶梯式和超晶格结构替代深紫外光发光二极管(DUV LED)的传统N型AlGaN层的新的N型限制层。仿真结果表明,新结构显着提高了DuV LED的光输出功率(循环)和内部量子效率(IQE)。这是因为量子阱(QWS)中的载波限制的能力是增强的;载体浓度和DUV LED的有源区中的载流子浓度和辐射重组率得到改善。

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