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Enhanced optical performance of AlGaN-based deep-ultraviolet light-emitting diode with m-shaped hole blocking layer and w-shaped electron blocking layer

机译:具有m形空穴阻挡层和w形电子阻挡层的AlGaN基深紫外发光二极管的增强的光学性能

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摘要

In this study, five AlGaN-based deep-ultraviolet light-emitting diodes (DUV LEDs) with different electron blocking layer (EBL) and hole blocking layer (HBL) have been investigated numerically. The simulation results demonstrate that the DUV LED with m-shaped HBL and w-shaped EBL has a better light output power and IQE compared with other DUV LEDs. The improvements are chiefly benefit to the high carrier concentration and high radiation recombination rate, which are caused by the lower carrier leakage and higher carrier injection in the active region of the DUV LED with m-shaped HBL and w-shaped EBL. In addition, smaller electrostatic fields in the active region of the DUV LED with m-shaped HBL and w-shaped EBL are conducive to raising the overlap of electrons and holes, thus enhance the radiation recombination rate.
机译:在这项研究中,对五个具有不同电子阻挡层(EBL)和空穴阻挡层(HBL)的AlGaN基深紫外发光二极管(DUV LED)进行了数值研究。仿真结果表明,与其他DUV LED相比,具有m形HBL和w形EBL的DUV LED具有更好的光输出功率和IQE。这些改进主要受益于高载流子浓度和高辐射复合率,这是由具有m形HBL和w形EBL的DUV LED的有源区域中较低的载流子泄漏和较高的载流子注入引起的。此外,具有m形HBL和w形EBL的DUV LED的有源区域中的静电场较小,有利于增加电子和空穴的重叠,从而提高辐射复合率。

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