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Influence of the vacancy-defect and transition-metal doping in arsenene: A first-principles study

机译:空位缺陷和过渡金属掺杂对砷的影响:第一性原理研究

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Using first-principles calculations, we investigated the influence of vacancy and transition metal (TM) atoms (Ti, V, Cr, Fe, Ni, and Zn) on the structural, electronic, and magnetic properties of arsenene. The larger binding energies than dopants in pristine arsenene indicated higher stability. Furthermore, the results of band structures indicated that vacancy-defected arsenene still maintained indirect bandgap, while the doping of Cr, Ni, and Zn induced a transition from indirect to direct bandgap. Meanwhile, TM-doping presented a diversity of magnetic properties, and the spin-polarization of TM-doped systems mainly originated from TM-atom or As-atoms around the vacancy.
机译:使用第一性原理计算,我们研究了空位和过渡金属(TM)原子(Ti,V,Cr,Fe,Ni和Zn)对砷的结构,电子和磁性的影响。原始砷中比掺杂剂更大的结合能表明更高的稳定性。此外,能带结构的结果表明,空位变形的砷仍保持了间接带隙,而Cr,Ni和Zn的掺杂诱导了从间接带隙向直接带隙的转变。同时,TM掺杂呈现出多种磁性,TM掺杂体系的自旋极化主要来源于空位周围的TM原子或As原子。

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  • 来源
    《Superlattices and microstructures》 |2019年第8期|106163.1-106163.9|共9页
  • 作者单位

    Henan Univ Sci & Technol, Coll Phys & Engn, Luoyang 471023, Peoples R China;

    Henan Univ Sci & Technol, Coll Phys & Engn, Luoyang 471023, Peoples R China|Henan Univ Sci & Technol, Henan Key Lab Photoelect Energy Storage Mat & App, Luoyang 471023, Peoples R China;

    Henan Univ Sci & Technol, Coll Phys & Engn, Luoyang 471023, Peoples R China;

    Henan Univ Sci & Technol, Coll Phys & Engn, Luoyang 471023, Peoples R China;

    Henan Univ Sci & Technol, Coll Phys & Engn, Luoyang 471023, Peoples R China;

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