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Influence of the vacancy-defect and transition-metal doping in arsenene: A first-principles study

机译:空置缺陷和过渡金属掺杂在砷中的影响:一项研究

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Using first-principles calculations, we investigated the influence of vacancy and transition metal (TM) atoms (Ti, V, Cr, Fe, Ni, and Zn) on the structural, electronic, and magnetic properties of arsenene. The larger binding energies than dopants in pristine arsenene indicated higher stability. Furthermore, the results of band structures indicated that vacancy-defected arsenene still maintained indirect bandgap, while the doping of Cr, Ni, and Zn induced a transition from indirect to direct bandgap. Meanwhile, TM-doping presented a diversity of magnetic properties, and the spin-polarization of TM-doped systems mainly originated from TM-atom or As-atoms around the vacancy.
机译:使用第一原理计算,我们研究了空位和过渡金属(TM)原子(TI,V,Cr,Fe,Ni和Zn)对砷烯的结构,电子和磁性的影响。较大的砷中的掺杂剂较大的结合能表明稳定性较高。此外,带结构的结果表明,空位缺陷的亚苯二烯仍保持间接带隙,而Cr,Ni和Zn的掺杂诱导从间接到直接带隙的转变。同时,TM掺杂呈现出磁性的多样性,TM掺杂系统的旋转极化主要源于空位周围的TM-原子或原子。

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  • 来源
    《Superlattices and microstructures》 |2019年第8期|106163.1-106163.9|共9页
  • 作者单位

    Henan Univ Sci & Technol Coll Phys & Engn Luoyang 471023 Peoples R China;

    Henan Univ Sci & Technol Coll Phys & Engn Luoyang 471023 Peoples R China|Henan Univ Sci & Technol Henan Key Lab Photoelect Energy Storage Mat & App Luoyang 471023 Peoples R China;

    Henan Univ Sci & Technol Coll Phys & Engn Luoyang 471023 Peoples R China;

    Henan Univ Sci & Technol Coll Phys & Engn Luoyang 471023 Peoples R China;

    Henan Univ Sci & Technol Coll Phys & Engn Luoyang 471023 Peoples R China;

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