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The Electronic Properties of O-Doped Pure and Sulfur Vacancy-Defect Monolayer WS2: A First-Principles Study

机译:O-掺杂纯净和硫空位缺陷单层WS2的电子性质:一项第一原理研究

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摘要

Based on the density functional theory (DFT), the electronic properties of O-doped pure and sulfur vacancy-defect monolayer WS2 are investigated by using the first-principles method. For the O-doped pure monolayer WS2, four sizes (2 × 2 × 1, 3 × 3 × 1, 4 × 4 × 1 and 5 × 5 × 1) of supercell are discussed to probe the effects of O doping concentration on the electronic structure. For the 2 × 2 × 1 supercell with 12.5% O doping concentration, the band gap of O-doped pure WS2 is reduced by 8.9% displaying an indirect band gap. The band gaps in 3 × 3 × 1 and 4 × 4 × 1 supercells are both opened to some extent, respectively, for 5.55% and 3.13% O doping concentrations, while the band gap in 5 × 5 × 1 supercell with 2.0% O doping concentration is quite close to that of the pure monolayer WS2. Then, two typical point defects, including sulfur single-vacancy (VS) and sulfur divacancy (V2S), are introduced to probe the influences of O doping on the electronic properties of WS2 monolayers. The observations from DFT calculations show that O doping can broaden the band gap of monolayer WS2 with VS defect to a certain degree, but weaken the band gap of monolayer WS2 with V2S defect. Doping O element into either pure or sulfur vacancy-defect monolayer WS2 cannot change their band gaps significantly, however, it still can be regarded as a potential method to slightly tune the electronic properties of monolayer WS2.
机译:基于密度函数理论(DFT),通过使用第一原理方法研究了O掺杂纯净和硫空位缺损单层WS2的电子性质。对于O掺杂的纯单层WS2,讨论了四种尺寸(2×2×1,3×3×1,4×4×1和5×5×5×5×5×1),以探讨o掺杂浓度对的影响电子结构。对于具有12.5%O掺杂浓度的2×2×1超级胶片,O掺杂纯WS2的带隙减小了8.9%,显示间接带隙。 3×3×1和4×4×1超级电池的带间隙分别在某种程度上分别在某种程度上打开5.55%和3.13%的o掺杂浓度,而带隙5×5×1超级胶片,其中2.0%o掺杂浓度非常接近纯单层WS2的浓度。然后,引入了两个典型的点缺陷,包括硫单空位(Vs)和硫包括硫包括硫,以探讨o掺杂对Ws2单层电子性质的影响。来自DFT计算的观察结果表明,o掺杂可以将单层WS2与VS缺陷的带隙扩大到一定程度,但削弱了与V2S缺陷的单层WS2的带隙。将O元素掺杂到纯净或硫空的空位缺陷单层WS2不能显着改变它们的带间隙,然而,它仍然可以被视为略微调节单层WS2的电子性质的潜在方法。

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