首页> 外文期刊>Superlattices and microstructures >A new design approach to improve DC, analog/RF and linearity metrics of Vertical TFET for RFIC design
【24h】

A new design approach to improve DC, analog/RF and linearity metrics of Vertical TFET for RFIC design

机译:一种新的设计方法,可改善用于RFIC设计的垂直TFET的DC,模拟/ RF和线性度

获取原文
获取原文并翻译 | 示例

摘要

This paper presents a novel design of Vertical Tunnel Field Effect Transistor (VTFET) using work-function engineering. In this work, we investigate the impact of work-function engineering for the enhancement of the metrics such as DC, analog/RF and linearity parameters for the low-power, high-speed and high-frequency applications. Using this concept of device engineering, it is demonstrated that VTFET offers the superior improvement in terms of steeper subthreshold slope, SS = 26 mV/decade, which results in increase of ON-state current, reduction in DIBL = 25mV/V and increment in ratio of I-ON/I-OFF of the order of 10(11). Moreover, the appropriate selection of work-function for the source, gate and drain electrodes in metal electrodes work function engineering (MEWE) VTFET deals with the trade-off between analog/RF and linearity parameters. This device offers tremendous results in terms of analog/RF and linearity performance as comparison to conventional VTFET and also overcome the drawbacks like short-channel effects and hot-carrier effects.
机译:本文介绍了使用功函数工程设计的垂直隧道场效应晶体管(VTFET)的新颖设计。在这项工作中,我们调查了工作功能工程对诸如低功耗,高速和高频应用的直流,模拟/ RF和线性参数等指标的增强的影响。利用器件工程学的这一概念,表明VTFET在更陡峭的亚阈值斜率SS = 26 mV / decade方面提供了卓越的改进,这导致导通电流的增加,DIBL的降低= 25mV / V以及导通电流的增加。 I-ON / I-OFF之比约为10(11)。此外,在金属电极功函数工程(MEWE)VTFET中为源电极,栅电极和漏电极选择合适的功函数可解决模拟/ RF和线性参数之间的折衷问题。与传统的VTFET相比,该器件在模拟/ RF和线性性能方面提供了惊人的结果,并且还克服了短通道效应和热载流子效应等缺点。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号