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4H-SiC double-layer thin n-base light triggered thyristor with a trenched-junction isolated amplifying gate

机译:具有沟槽结隔离放大门的4H-SiC双层薄n基光触发晶闸管

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摘要

In this paper, a new 4H-SiC double-layer thin n-base LTT with a trenched junction isolated amplifying gate is proposed and investigated to compensate for the shortcomings of the conventional SiC amplifying gate structures. By using double-layer thin n-base structure, the turn-on performance of the pilot LTT is improved. According to simulations, the trenched-junction isolated amplifying gate works well and the turn-on delay of the proposed device is only 451 ns, when triggered by 500 mW/cm(2) ultraviolet light. Meanwhile, the breakdown voltage remains higher than 10 kV. Comparing with conventional resistance isolated amplifying gate and trench isolated amplifying gate, the proposed trenched-junction isolated gate structure shows better performances in both area utilization and blocking characteristic.
机译:本文提出了一种新型的带有沟槽结隔离放大栅极的4H-SiC双层薄n基LTT LTT,并进行了研究以弥补传统SiC放大栅极结构的缺点。通过使用双层薄n基极结构,可以提高导频LTT的导通性能。根据模拟,沟槽结隔离放大门工作良好,当被500 mW / cm(2)紫外光触发时,该器件的开启延迟仅为451 ns。同时,击穿电压保持高于10 kV。与常规的电阻隔离放大栅极和沟槽隔离放大栅极相比,所提出的沟槽结隔离栅极结构在面积利用率和阻挡特性方面均表现出更好的性能。

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