Department of Electronic Engineering, Xi’an University of Technology, Xi’an, China;
Department of Electronic Engineering, Xi’an University of Technology, Xi’an, China;
Department of Electronic Engineering, Xi’an University of Technology, Xi’an, China;
Department of Electronic Engineering, Xi’an University of Technology, Xi’an, China;
Department of Electronic Engineering, Xi’an University of Technology, Xi’an, China;
Department of Electronic Engineering, Xi’an University of Technology, Xi’an, China;
Department of Electronic Engineering, Xi’an University of Technology, Xi’an, China;
Silicon carbide; Thyristors; Semiconductor process modeling; Electric fields; Doping; Delays; Junctions;
机译:具有沟槽结隔离放大门的4H-SiC双层薄n基光触发晶闸管
机译:双层薄n基极对4H-SiC光触发晶闸管中p + -n发射极结的注入调制
机译:通过7形薄型n基极掺杂轮廓来缩短SiC光触发晶闸管的导通延迟
机译:4H-SIC光触发晶闸管,逐渐掺杂薄N基
机译:光触发发射极关断(LT-ETO)晶闸管的开发和应用。
机译:具有重掺杂区域的新型4H-SiC MESFET轻微掺杂的区域和绝缘区域
机译:紫外光致发光成像光谱技术在厚,轻度n型掺杂,4°-off 4H-SiC外延层上的堆垛层错识别中的应用
机译:用于电力系统的光触发晶闸管(第2阶段)。中期报告