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Simulated turn-off of 4H-SiC gate turn-off thyristors with gate electrodes on the p-base or the n-base

机译:模拟的4H-SiC栅极关断晶闸管的关断,其栅极位于p基或n基上

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摘要

Turn-off simulations of a 4H-SiC GTO thyristor structure having a gated p-base and p-type substrate are compared with that having a gated n-base and n-type substrate. Two gate drive circuits are considered, one with a voltage source and resistor between the gate and adjacent emitter region, and the other with a voltage source and resistor between the gate and farthest emitter region. The gated n-base thyristor's substrate current increases atypically before the device turns off. Also, the gated n-base structure turns off when the gate circuit is connected directly to the emitter region furthest from the gate region, but the gated p-base structure does not. Furthermore, turn-off gain is lower for the gated n-base structure due to mobility differences as demonstrated by current-voltage (I-V) and current versus time (I-t) curves.
机译:比较了具有门控p型基极和p型衬底的4H-SiC GTO晶闸管结构的关断仿真与具有门控n型基极和n型衬底的关断仿真。考虑了两个栅极驱动电路,一个在栅极和相邻的发射极区域之间具有电压源和电阻,另一个在栅极和最远的发射极区域之间具有电压源和电阻。在器件关闭之前,门控n基晶闸管的衬底电流非典型地增加。此外,当栅极电路直接连接到距离栅极区域最远的发射极区域时,栅极n基极结构会关闭,但栅极p基极结构不会关闭。此外,由于电流-电压(I-V)和电流-时间(I-t)曲线所显示的迁移率差异,门控n基结构的关断增益较低。

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