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SiGe superlattice nanocrystal pure and doped with substitutional phosphorus single atom: Density functional theory study

机译:掺杂有取代磷单原子的SiGe超晶格纳米晶体:密度泛函理论研究

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Ab initio density functional theory is used to simulate electronic structure of hydrogenated SiGe nanocrystal superlattice pure and doped with substitutional P single atom. The results of electronic structure calculations are compared to the same size silicon and germanium nanocrystals. The comparison reveals that the energy gap of the three kinds of nanocrystals is nearly the same in non-relativistic and relativistic limits. Because of large width of gap in the present small nanocrystals the relativistic corrections are not as much important as in the case of bulk crystals. The doping of SiGe nanocrystal with P single atom introduced an impurity level at 4 eV below original conduction band edge. This result is much larger than comparable silicon bulk and nanocrystal doping with P atoms. Results also show that the deep internal angles and bonds in SiGe nanocrystals reach approximately the angles and structure of bulk crystals after nearly three surface layers. A double positively charged layer is located at the Ge terminated surface of SiGe nanocrystal. This layer is enhanced and is accompanied with a large increase of the dipole moment of the nanocrystal in the case of P doped nanocrystal. Due to oscillatory lattice potential in SiGe superlattice, density of states show that bands are broken up to sub-bands in comparison with silicon nanocrystal density of states especially at the conduction band.
机译:从头算密度函数理论用于模拟纯净和掺杂有取代P单原子的氢化SiGe纳米晶超晶格的电子结构。将电子结构的计算结果与相同尺寸的硅和锗纳米晶体进行比较。比较表明,在非相对论和相对论极限下,三种纳米晶体的能隙几乎相同。由于当前的小纳米晶体中间隙的宽度较大,相对论校正的重要性不如块状晶体重要。用P单原子掺杂SiGe纳米晶体在原始导带边缘以下4 eV处引入了杂质能级。该结果远大于可比较的硅块和P原子掺杂的纳米晶体。结果还表明,在近三个表面层之后,SiGe纳米晶体的深内角和键近似达到块状晶体的角度和结构。双带正电的层位于SiGe纳米晶体的Ge端接表面。在掺杂P的纳米晶体的情况下,该层被增强并且伴随着纳米晶体的偶极矩的大大增加。由于SiGe超晶格中的振荡晶格势,与硅纳米晶体的状态密度(尤其是在导带处)相比,状态密度显示出能带被分解为子带。

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