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AlGaN-based ultraviolet light-emitting diodes on sputter-deposited A1N templates with epitaxial AlN/AlGaN superlattices

机译:具有外延AlN / AlGaN超晶格的溅射沉积AlN模板上的基于AlGaN的紫外发光二极管

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摘要

AbstractWe demonstrate AlGaN-based ultraviolet light-emitting diodes (UV-LEDs) grown by metalorganic chemical vapor deposition (MOCVD) on sputter-deposited AlN templates upon sapphire substrates. An AlN/AlGaN superlattices structure is inserted as a dislocation filter between the LED structure and the AlN template. The full width at half maximum values for (0002) and (101¯2) X-ray rocking curves of the n-type Al0.56Ga0.44N layer are 513 and 1205 arcsec, respectively, with the surface roughness of 0.52 nm. The electron concentration and mobility measured by Hall measurement are 9.3 × 1017cm−3and 54 cm2/V·s at room temperature, respectively. The light output power of a 282-nm LED reaches 0.28 mW at 20 mA with an external quantum efficiency of 0.32%. And the values of leakage current and forward voltage of the LEDs are ∼3 nA at −10 V and 6.9 V at 20 mA, respectively, showing good electrical performance. It is expected that the cost of the UV-LED can be reduced by using sputter-deposited AlN template.HighlightsAlGaN-based UV-LEDs on sputtered AlN templates are realized, without commonly used MOCVD-grown AlN templates.With the use of the sputtered AlN template, the cost of the UV-LEDs could be reduced.The 200 nm AlN template is proved to be better to improve the epitaxial crystal quality and performance of the UV-LED.
机译: 摘要 我们展示了通过金属有机化学气相沉积(MOCVD)在溅射沉积过程中生长的基于AlGaN的紫外发光二极管(UV-LED)蓝宝石衬底上的AlN模板。在LED结构和AlN模板之间插入AlN / AlGaN超晶格结构作为位错滤波器。 (0002)和(10 1 2)n型Al 0.56 Ga 0.44 N层分别为513和1205 arcsec,表面粗糙度为0.52 nm。通过霍尔测量测得的电子浓度和迁移率是9.3×10 17 cm − 3 在室温下分别为54 cm 2 / V·s。 282 nm LED的光输出功率在20 mA时达到0.28 mW,外部量子效率为0.32%。 LED的泄漏电流和正向电压在-10V和20mA时分别为〜3 nA和6.9 V,显示出良好的电气性能。预期可以通过使用溅射沉积的AlN模板来降低UV-LED的成本。 突出显示 在溅射的AlN模板上实现了基于AlGaN的UV-LED,而无需使用常用的MOCVD生长的AlN模板。 使用溅射的AlN模板,可以降低UV-LED的成本。 200 nm AlN模板是p证明可以更好地改善UV-LED的外延晶体质量和性能。

著录项

  • 来源
    《Superlattices and microstructures》 |2018年第1期|713-719|共7页
  • 作者单位

    Research and Development Center for Solid State Lighting, Institute of Semiconductors, Chinese Academy of Sciences,University of Chinese Academy of Sciences;

    Research and Development Center for Solid State Lighting, Institute of Semiconductors, Chinese Academy of Sciences,University of Chinese Academy of Sciences;

    Research and Development Center for Solid State Lighting, Institute of Semiconductors, Chinese Academy of Sciences,University of Chinese Academy of Sciences;

    Research and Development Center for Solid State Lighting, Institute of Semiconductors, Chinese Academy of Sciences,University of Chinese Academy of Sciences;

    Research and Development Center for Solid State Lighting, Institute of Semiconductors, Chinese Academy of Sciences;

    Research and Development Center for Solid State Lighting, Institute of Semiconductors, Chinese Academy of Sciences;

    Research and Development Center for Solid State Lighting, Institute of Semiconductors, Chinese Academy of Sciences,University of Chinese Academy of Sciences;

    Research and Development Center for Solid State Lighting, Institute of Semiconductors, Chinese Academy of Sciences,University of Chinese Academy of Sciences;

    Research and Development Center for Solid State Lighting, Institute of Semiconductors, Chinese Academy of Sciences,University of Chinese Academy of Sciences;

    Research and Development Center for Solid State Lighting, Institute of Semiconductors, Chinese Academy of Sciences,University of Chinese Academy of Sciences;

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  • 正文语种 eng
  • 中图分类
  • 关键词

    Ultraviolet light-emitting diodes; AlN template; Sputtering; Metalorganic chemical vapor deposition; AlGaN;

    机译:紫外发光二极管;AlN模板;溅射;金属有机化学气相沉积;AlGaN;

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