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A 32 kb 10T Sub-Threshold SRAM Array With Bit-Interleaving and Differential Read Scheme in 90 nm CMOS

机译:在90 nm CMOS中具有位交错和差分读取方案的32 kb 10T次阈值SRAM阵列

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Ultra-low voltage operation of memory cells has become a topic of much interest due to its applications in very low energy computing and communications. However, due to parameter variations in scaled technologies, stable operation of SRAMs is critical for the success of low-voltage SRAMs. It has been shown that conventional 6T SRAMs fail to achieve reliable subthreshold operation. Hence, researchers have considered different configuration SRAMs for subthreshold operations having single-ended 8T or 10T bit-cells for improved stability. While these bit-cells improve SRAM stability in subthreshold region significantly, the single-ended sensing methods suffer from reduced bit-line swing due to bit-line leakage noise. In addition, efficient bit-interleaving in column may not be possible and hence, the multiple-bit soft errors can be a real issue. In this paper, we propose a differential 10T bit-cell that effectively separates read and write operations, thereby achieving high cell stability. The proposed bit-cell also provides efficient bit-interleaving structure to achieve soft-error tolerance with conventional Error Correcting Codes (ECC). For read access, we employ dynamic DCVSL scheme to compensate bitline leakage noise, thereby improving bitline swing. To verify the proposed techniques, a 32 kb array of the proposed 10T bit-cell is fabricated in 90 nm CMOS technology. The hardware measurement results demonstrate that this bit-cell array successfully operates down to 160 mV. For leakage power comparison, we also fabricated 49 kb arrays of the 6T and the proposed 10T bit-cells. Measurement results show that the leakage power of the proposed bit-cell is close to that of the 6T (between 0.96x and 1.22x of 6T).
机译:由于存储单元的超低电压操作在非常低的能量计算和通信中的应用,已经成为人们非常关注的话题。然而,由于缩放技术中的参数变化,SRAM的稳定运行对于低压SRAM的成功至关重要。已经表明,常规的6T SRAM不能实现可靠的亚阈值操作。因此,研究人员针对具有亚端8T或10T位单元的亚阈值操作考虑了不同的配置SRAM,以提高稳定性。尽管这些位单元显着提高了亚阈值区域中的SRAM稳定性,但由于位线泄漏噪声,单端检测方法仍会降低位线摆幅。另外,列中的有效位交织可能是不可能的,因此,多位软错误可能是一个实际问题。在本文中,我们提出了一种差分10T位单元,该位单元可有效地分离读写操作,从而实现较高的单元稳定性。所提出的比特单元还提供有效的比特交织结构,以利用传统的纠错码(ECC)实现软容错。对于读访问,我们采用动态DCVSL方案来补偿位线泄漏噪声,从而改善位线摆动。为了验证所提出的技术,在90 nm CMOS技术中制造了所提出的10T位单元的32 kb阵列。硬件测量结果表明,该位单元阵列成功地工作至160 mV。为了进行泄漏功率比较,我们还制造了49 kb的6T阵列和建议的10T比特单元。测量结果表明,所提出的位单元的泄漏功率接近6T的泄漏功率(在6T的0.96x和1.22x之间)。

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