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Design and Iso-Area $V_{min}$ Analysis of 9T Subthreshold SRAM With Bit-Interleaving Scheme in 65-nm CMOS

机译:在65 nm CMOS中采用位交错方案的9T亚阈值SRAM的设计和等值面积$ V_ {min} $分析

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In this brief, a 9T bit cell is proposed to enhance write ability by cutting off the positive feedback loop of a static random-access memory (SRAM) cross-coupled inverter pair. In read mode, an access buffer is designed to isolate the storage node from the read path for better read robustness and leakage reduction. The bit-interleaving scheme is allowed by incorporating the proposed 9T SRAM bit cell with additional write wordlines (WWL/WWLb) for soft-error tolerance. A 1-kb 9T 4-to-1 bit-interleaved SRAM is implemented in 65-nm bulk CMOS technology. The experimental results demonstrate that the test chip minimum energy point occurs at 0.3-V supply voltage. It can achieve an operation frequency of 909 kHz with 3.51-$muhbox{W}$ active power consumption.
机译:在本简介中,提出了一种9T位单元,通过切断静态随机存取存储器(SRAM)交叉耦合的反相器对的正反馈环路来增强写能力。在读取模式下,访问缓冲区被设计为将存储节点与读取路径隔离开,以实现更好的读取鲁棒性和泄漏减少。通过将建议的9T SRAM位单元与附加的写字线(WWL / WWLb)结合使用,可以实现位交织方案,以实现软错误容限。在65nm批量CMOS技术中实现了1kb 9T 4比1比特交错的SRAM。实验结果表明,测试芯片的最小能量点出现在0.3V电源电压下。在3.51 $ muhbox {W} $有功功耗的情况下,它可以达到909 kHz的工作频率。

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