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An 800 MS/s Dual-Residue Pipeline ADC in 40 nm CMOS

机译:采用40 nm CMOS的800 MS / s双残留流水线ADC

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This paper presents a 12-bit dual-residue pipeline ADC allowing the use of low gain and low bandwidth residue amplifiers to achieve 59 dB peak SNDR at 800 MSample/s. The dual-residue architecture is insensitive to the open-loop gain and the bandwidth of the residue amplifiers. However, their offset limits the accuracy of the entire ADC and therefore a background offset calibration technique was implemented. The high sampling speed was obtained through four times interleaving, requiring gain and offset calibration between the interleaved ADC lanes. The ADC was realized in a standard 40 nm CMOS technology, operates from a dual 1 V/2.5 V power supply, utilizes an input range of 1.2 V peak-to-peak differential, and consumes 105 mW.
机译:本文介绍了一种12位双残留流水线ADC,允许使用低增益和低带宽残留放大器在800 MSample / s时达到59 dB的峰值SNDR。双残差架构对残差放大器的开环增益和带宽不敏感。但是,它们的失调限制了整个ADC的精度,因此实施了背景失调校准技术。高采样速度是通过四次交织获得的,需要在交织的ADC通道之间进行增益和失调校准。该ADC采用标准的40 nm CMOS技术实现,采用1 V / 2.5 V双电源供电,利用1.2 V峰峰值差分输入范围,功耗为105 mW。

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