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The growth of n-type GaSb by metal-organic chemical vapour deposition: effects of two-band conduction on carrier concentrations and donor activation

机译:金属有机化学气相沉积法生长n型GaSb:两带传导对载流子浓度和施主活化的影响

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n-type GaSb has been prepared by metal-organic chemical vapour deposition with tellurium donors using diethyltelluride as the dopant precursor. The maximum carrier concentration achieved was 1.7 x 10~(18) cm~(-3), as measured by van der Pauw-Hall effect measurements, for an atomic tellurium concentration of 1.8 x 10~(19) cm~(-3). The apparent low activation of tellurium donors is explained by a model that considers the effect of electrons occupying both the Γ and L bands in GaSb due to the small energy difference between the Γ and L conduction band minima. The model also accounts for the apparent increase in the carrier concentration determined by van der Pauw-Hall effect measurements at cryogenic temperatures.
机译:n型GaSb是通过使用碲化二乙基碲作为掺杂剂前体的碲供体通过金属有机化学气相沉积制备的。通过van der Pauw-Hall效应测量测得的最大载流子浓度为1.7 x 10〜(18)cm〜(-3),原子碲浓度为1.8 x 10〜(19)cm〜(-3) 。碲供体的明显低活化由一个模型解释,该模型考虑了由于Γ和L导带极小值之间的较小能量差而同时占据GaSb的Γ和L谱带的电子的影响。该模型还说明了在低温下通过范德堡-霍尔效应测量确定的载流子浓度的明显增加。

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