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Metal-organic chemical vapour deposition growth of InAs/GaSb type-II superlattice photodiodes

机译:InAs / GaSb II型超晶格光电二极管的金属有机化学气相沉积生长

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摘要

Presented for the first time is the realisation of InAs/GaSb type-II superlattice photodiodes grown by metal-organic chemical vapour deposition. The photovoltaic detectors have a cutoff wavelength (50% power responsivity) of ȣC;8 ;C;m at 78 K. The active region was grown on a p-type GaSb substrate and consists of an InAs(5.1 nm)/ GaSb(2.1 nm) superlattice. The R0A product is typically around 0.03 :9;-cm2 at 78 K. The responsivity is typically around 0.6 A/W and the detectivity is 1.6 x 109 at 78 K.
机译:首次提出的是通过金属有机化学气相沉积法生长的InAs / GaSb II型超晶格光电二极管的实现。光电探测器的截止波长(50%功率响应)在78 K时为mC; 8; C; m。有源区生长在p型GaSb衬底上,由InAs(5.1 nm)/ GaSb(2.1)组成nm)超晶格。 R0A乘积在78 K时通常约为0.03:9; -cm2。响应度通常在0.6 A / W左右,而探测率在78 K时为1.6 x 109。

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