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RF powered plasma enhanced chemical vapour deposition reactor and methods of effecting plasma enhanced chemical vapour deposition

机译:射频供电的等离子体增强化学气相沉积反应器和实现等离子体增强化学气相沉积的方法

摘要

A reactor comprises a chamber (31) defining a processing volume. A first electrode (32) is disposed inside the chamber and a second electrode (34) outside the chamber. A transformer has an input side and an output side, the input side being connected to and receiving power generated by, an RF power generator. The output side has at least one output terminal connected to the first electrode (32) and at least one other output terminal connected to the second electrode (34). The output side provides power to each of the first and second electrodes in accordance with a selected power ratio.
机译:反应器包括限定处理体积的腔室(31)。第一电极(32)设置在腔室内,第二电极(34)设置在腔外。变压器具有输入侧和输出侧,该输入侧连接到RF功率发生器并接收由RF功率发生器产生的功率。输出侧具有连接到第一电极(32)的至少一个输出端子和连接到第二电极(34)的至少一个其他输出端子。输出侧根据选择的功率比向第一和第二电极中的每个提供功率。

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