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Hole emission processes from InAs quantum dots grown on p-type InAlAs/InP(001)

机译:在p型InAlAs / InP(001)上生长的InAs量子点的空穴发射过程

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We report on the application of the deep level transient spectroscopy technique to the study of hole emission from the confined energy levels in quantum dots. The results are presented for self-assembled InAs quantum dots grown on p-type InAlAs barrier layers, lattice matched to an InP(001) substrate. Two deep levels, linked to the quantum dots, are detected, indicative of strong hole confinement. They were attributed respectively to hole emission from the ground state to the excited state with an activation energy of about 200 meV, and from the excited state to the InAlAs valence band edge with an activation energy of about 250 meV. A mechanism for a hole emission process occurring via an excited state is proposed.
机译:我们报道了深能级瞬态光谱技术在量子点中受限能级的空穴发射研究中的应用。给出了在p型InAlAs势垒层上生长的,与InP(001)衬底晶格匹配的自组装InAs量子点的结果。检测到与量子点相关的两个深能级,表明有严格的空穴限制。它们分别归因于从基态到激发态的空穴发射,其活化能为约200 meV,而从激发态到InAlAs价带边缘的空穴发射具有约250 meV的活化能。提出了一种通过激发态发生空穴发射过程的机制。

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