Capacitance-voltage profile characteristics of Schottky barrier structure with InAs quantum dots grown on InAlAs/InP(001)

摘要

Capacitance-voltage, C(V) studies have been carried out on Schottky barrier structure containing a sheet of self-organized InAs quantum dots (QDs) grown on InAlAs lattice matched to InP in order to deduce the electrical properties of the QDs. Three electron levels have been detected in n-type material, and were attributed to the s ground, the p excited, and the d excited states. Some parameters of the structure, such as the position of the InAs QD plane, the electron concentration in the QDs and an approximate QD height were deduced from the C(V) profile analysis. These results are in good agreement with the transmission electron microscopy (TEM) study realized on the structure.