机译:基于GaAs的APD表面钝化对表面暗电流的影响
Electric Power IT Center, Korea Electronics Technology Institute, Seongnam 463-816, Korea Department of Electrical Engineering, Korea University, Seoul 136-701, Korea;
Electric Power IT Center, Korea Electronics Technology Institute, Seongnam 463-816, Korea;
Electric Power IT Center, Korea Electronics Technology Institute, Seongnam 463-816, Korea;
Electric Power IT Center, Korea Electronics Technology Institute, Seongnam 463-816, Korea;
Department of Electrical Engineering, Korea University, Seoul 136-701, Korea;
Department of Electrical Engineering, Korea University, Seoul 136-701, Korea;
Electric Power IT Center, Korea Electronics Technology Institute, Seongnam 463-816, Korea;
机译:基于GaAs的雪崩光电二极管SiN_χ与聚酰亚胺表面钝化之间暗电流的比较分析
机译:两步SiN / sub x /表面钝化改善台面InGaAs / InP p-i-n光电二极管的暗电流特性和长期稳定性
机译:X射线光电子能谱研究(111)B表面上AlGaAs / GaAs量子结构的硅中间层表面钝化
机译:扩展波长InGaAs光电二极管的暗电流特性与材料表面缺陷关系的研究
机译:GaAs(001)表面的光学性质的理论分析和半导体的应变依赖性晶格特性
机译:基于台面结构的聚酰亚胺钝化InAlAs / InGaAs APD的制备与表征
机译:X射线光电子能谱研究(111)B表面上基于AlGaAs / GaAs量子结构的硅中间层的表面钝化