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Analysis of surface dark current dependent upon surface passivation in APD based on GaAs

机译:基于GaAs的APD表面钝化对表面暗电流的影响

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摘要

In this paper, we investigated the dependence of reverse dark current on two types of surface passivation, one of which is polyimide and the other is SiN_x, for InAs quantum dots/GaAs separate absorption, charge, multiplication avalanche photodiode (SACM APD). From the experimental results, we found that dark current was dominated by surface current, and not bulk current. It was also noted that SiN_x passivation has a surface current that is lower by three to nine times in magnitude than that in polyimide passivation in the whole range of bias. To analyze the difference in dark current due to the passivation types, we propose the theoretical current components. This shows that the dark current of both passivation types is mainly composed of generation-recombination (G-R) and tunneling components, originating from the surface. However, each component has a different magnitude for passivation types, which can be explained by carrier concentration and trap density. The dependence of dark current on temperaturern shows the different behaviors between passivation types and supports a theoretical description of current components.
机译:在本文中,我们针对InAs量子点/ GaAs分别吸收,电荷,倍增雪崩光电二极管(SACM APD),研究了反向暗电流对两种类型的表面钝化的依赖性,其中一种是聚酰亚胺,另一种是SiN_x。从实验结果中,我们发现暗电流主要由表面电流决定,而不是体电流。还应注意,在整个偏置范围内,SiN_x钝化的表面电流的大小比聚酰亚胺钝化的表面电流小三到九倍。为了分析由于钝化类型导致的暗电流差异,我们提出了理论电流分量。这表明两种钝化类型的暗电流主要由产生复合(G-R)和隧穿成分组成,这些成分源自表面。但是,对于钝化类型,每种组分的大小都不同,这可以用载流子浓度和阱密度来解释。暗电流对温度的依赖性显示出钝化类型之间的不同行为,并支持电流成分的理论描述。

著录项

  • 来源
    《Semiconductor science and technology》 |2009年第6期|93-97|共5页
  • 作者单位

    Electric Power IT Center, Korea Electronics Technology Institute, Seongnam 463-816, Korea Department of Electrical Engineering, Korea University, Seoul 136-701, Korea;

    Electric Power IT Center, Korea Electronics Technology Institute, Seongnam 463-816, Korea;

    Electric Power IT Center, Korea Electronics Technology Institute, Seongnam 463-816, Korea;

    Electric Power IT Center, Korea Electronics Technology Institute, Seongnam 463-816, Korea;

    Department of Electrical Engineering, Korea University, Seoul 136-701, Korea;

    Department of Electrical Engineering, Korea University, Seoul 136-701, Korea;

    Electric Power IT Center, Korea Electronics Technology Institute, Seongnam 463-816, Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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