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Comparative analysis of dark current between SiN_χ and polyimide surface passivation of an avalanche photodiode based on GaAs

机译:基于GaAs的雪崩光电二极管SiN_χ与聚酰亚胺表面钝化之间暗电流的比较分析

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摘要

In this paper, we present the effects of different surface passivation types, one with SiN_χ and the other with polyimide (PI), on the dark (leakage) current of a GaAs-based avalanche photodiode. We identified that the reverse dark current originates from the surface, and not from the bulk, showing the nearly linear dependence on perimeters of active-mesa (A-M) up to 90% of breakdown voltage (V_(br)). From the theoretical results, total dark current consists of generation-recombination (G-R), shunt and tunneling components from a surface and the avalanche gain component from a bulk for both passivation types. Although the bulk component of avalanche gain-bulk current generates the breakdown process, it appears only near V_(br) (12.7 V) because of a very small bulk current of a few fA in theory. For a surface current, SiN_x passivation has values two to eight times lower than PI passivation. The different behaviors of surface current between passivation types could be theoretically explained by quantitative description of the current components.
机译:在本文中,我们介绍了不同的表面钝化类型,一种是用SiN_χ,另一种是用聚酰亚胺(PI),对基于GaAs的雪崩光电二极管的暗(漏)电流的影响。我们确定反向暗电流起源于表面,而不是主体电流,显示出高达90%的击穿电压(V_(br))对有源台面(A-M)的周长几乎呈线性依赖性。从理论结果来看,对于两种钝化类型,总暗电流都由表面的生成复合(G-R),分流和隧穿分量以及大量的雪崩增益分量组成。尽管雪崩增益体电流的主体部分会产生击穿过程,但由于理论上只有几fA的非常小的体电流,因此它仅出现在V_(br)(12.7 V)附近。对于表面电流,SiN_x钝化的值比PI钝化低2至8倍。钝化类型之间表面电流的不同行为可以在理论上通过对电流分量的定量描述来解释。

著录项

  • 来源
    《Semiconductor science and technology》 |2009年第5期|75-79|共5页
  • 作者单位

    Electric Power IT Center, Korea Electronics Technology Institute, Seongnam 463-816, Korea Department of Electrical Engineering, Korea University, Seoul 136-701, Korea;

    Electric Power IT Center, Korea Electronics Technology Institute, Seongnam 463-816, Korea;

    Electric Power IT Center, Korea Electronics Technology Institute, Seongnam 463-816, Korea;

    Electric Power IT Center, Korea Electronics Technology Institute, Seongnam 463-816, Korea;

    Department of Electrical Engineering, Korea University, Seoul 136-701, Korea;

    Department of Electrical Engineering, Korea University, Seoul 136-701, Korea;

    Electric Power IT Center, Korea Electronics Technology Institute, Seongnam 463-816, Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 01:31:56

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