Relative Irradiance Measurement and Bonding Configurations of Amorphous Fluorinated Carbon Films Deposited by Electron Cyclotron Resonance Plasma

YE Chao; KANG Jian; NING Zhao-yuan

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Relative Irradiance Measurement and Bonding Configurations of Amorphous Fluorinated Carbon Films Deposited by Electron Cyclotron Resonance Plasma

机译：电子回旋共振等离子体沉积非晶氟化碳膜的相对辐照度测量和键合构型

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α-C: F films are deposited by microwave electron cyclotron resonance (ECR) plasma chemical vapor deposition (CVD) using trifluoromethane (CHF_3) and benzene (C_6H_6) as source gases at different microwave powers. The radicals in plasma originating from source gases disso- ciation are analyzed by relative irradiance measurement.

机译：使用三氟甲烷（CHF_3）和苯（C_6H_6）作为源气体，以不同的微波功率通过微波电子回旋共振（ECR）等离子体化学气相沉积（CVD）沉积α-C：F膜。通过相对辐照度测量来分析源自源气体离解的等离子体中的自由基。

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《Plasma Science & Technology》 |2000年第5期|p.469-474|共6页
作者
YE Chao; KANG Jian; NING Zhao-yuan;
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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);
原文格式 PDF
正文语种 eng
中图分类物理学;
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1. Relative Irradiance Measurement and Bonding Configurations of Amorphous Fluorinated Carbon Films Deposited by Electron Cyclotron Resonance Plasma [J] . 叶超, 康健, 宁兆元, 等离子体科学和技术：英文版 . 2000,第005期

机译：电子回旋共振等离子体沉积的无定形氟化碳膜的相对辐照度测量和粘合配置
2. Optical gap of fluorinated amorphous carbon films prepared by electron cyclotron resonance trifluromethane and benzene plasmas [J] . Chao Ye, Zhaoyuan Ning, Shanhua Cheng Diamond and Related Materials . 2004,第1期

机译：电子回旋共振三氟甲烷和苯等离子体制备的氟化非晶碳薄膜的光学间隙
3. On the hydrogen incorporation, intrinsic stress and thermal stability of hydrogenated amorphous carbon films deposited from an electron cyclotron resonance plasma [J] . Benlahsen M., Zellama K., Turban G., Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites . 2001,第1a3期

机译：电子回旋共振等离子体沉积的氢化非晶态碳膜的氢结合，固有应力和热稳定性
4. EFFECT OF ION ACCELERATION VOLTAGE ON THE SYNTHESIS OF CONDUCTIVE AND HARD FLUORINATED CARBON THIN FILMES IN ELECTRON CYCLOTRON RESONANCE PLASMA SPUTTERING [C] . Tomoyuki Kamata, Hirokazu Kawase, Tetsuya Itagaki, International conference on carbon;CARBON 08 . 2008

机译：离子加速电压对电子回旋共振等离子体溅射中导电和硬质氟化碳薄膜合成的影响
5. Nanocrystalline and amorphous silicon thin film transistors deposited by microwave plasma electron cyclotron resonance chemical vapor deposition: Material analysis, device fabrication and characterization. [D] . Teng, Lihong. 2003

机译：微波等离子体电子回旋共振化学气相沉积法沉积的纳米晶和非晶硅薄膜晶体管：材料分析，器件制造和表征。
6. Substrate Temperature Dependent Microstructure and Electron-Induced Secondary Electron Emission Properties of Magnetron Sputter-Deposited Amorphous Carbon Films [O] . Jie Li, Xingkang Yi, Wenbo Hu, 2019

机译：磁控溅射沉积非晶碳膜的基体温度相关的微观结构和电子诱导的二次电子发射特性
7. Bonding configuration and density of defects of SiOxHy thin films deposited by the electron cyclotron resonance plasma method [O] . Mártil de la Plaza Ignacio, González Díaz Germán, Prado Millán Álvaro del, 2003

机译：电子回旋共振等离子体法沉积SiOxHy薄膜的键合构型和缺陷密度
8. Properties of Carbon Nitride Films Deposited With and Without Electron Cyclotron Resonance Plasma Assistance [R] . Chen, M. Y. , Kramer, D. J. 2001

机译：电子回旋共振等离子体辅助沉积碳氮化物薄膜的性质

Relative Irradiance Measurement and Bonding Configurations of Amorphous Fluorinated Carbon Films Deposited by Electron Cyclotron Resonance Plasma

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