Process for the deposition by electron cyclotron resonance plasma of electron-emitting carbon films under the effect of an electric field applied

摘要

The present invention relates to a process for electron cyclotron resonance plasma deposition of electron-emitting carbon films, in which by injecting a microwave power into a plasma chamber incorporating an electron cyclotron resonance zone (9), ionization takes place of a gaseous mixture under a low pressure, the thus created ions and electrons diffusing along the magnetic field lines (6) to a substrate (3), the gaseous mixture comprising organic molecules and hydrogen molecules. Said process comprises the following stages:;heating the substrate (3),;creating a plasma from the ionized gaseous mixture,;creating a potential difference between the plasma and the substrate,;diffusion of the plasma up to the substrate (3) which, by heating, has reached a temperature such that said electron-emitting material is deposited on the substrate.