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Bonding configuration and density of defects of SiOxHy thin films deposited by the electron cyclotron resonance plasma method

机译：电子回旋共振等离子体法沉积SiOxHy薄膜的键合构型和缺陷密度

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Mártil de la Plaza Ignacio; González Díaz Germán; Prado Millán Álvaro del; San Andres Serrano Enrique;
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2. Relative Irradiance Measurement and Bonding Configurations of Amorphous Fluorinated Carbon Films Deposited by Electron Cyclotron Resonance Plasma [J] . 叶超, 康健, 宁兆元, 等离子体科学和技术：英文版 . 2000,第005期

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3. Bonding structure and hydrogen content in silicon nitride thin films deposited by the electron cyclotron resonance plasma method [J] . F.L. Martinez, R. Ruiz-Merino, A. del Prado, Thin Solid Films . 2004,第1a2期

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6. A Convenient and Effective Method to Deposit Low-Defect-Density nc-Si:H Thin Film by PECVD [O] . Yuwei Wang, Hong Liu, Wenzhong Shen 2018

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Bonding configuration and density of defects of SiOxHy thin films deposited by the electron cyclotron resonance plasma method

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