Low Temperature Deposition of Antibacterially Active Silicon Oxide Layers Containing Silver Nanoparticles, Prepared by Atmospheric Pressure Plasma Chemical Vapor Deposition

摘要

This study presents investigations to create antibacterially active thin films by using the atmospheric pressure plasma chemical vapor deposition technique. Silver nitrate solutions are sprayed and converted within the plasma to create and implement formed silver nanoparticles into a growing SiO_x-matrix in situ during the deposition step. Investigation of the films on their bactericidal activity using an Escherichia coli (E. coli) strain shows a strong antibacterial effect of the coatings and additionally a good stability against abrasive wear. The films are characterized by X-ray photoelectron spectroscopy, SEM, energy dispersive X-ray spectroscopy, and IR spectroscopy.