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机译:MgO(001)衬底上立方InN膜的RF-MBE生长
Department of Electrical and Electronic System Engineering, Faculty of Engineering, Saitama University, 255 Shimo-Ohkubo, Sakura-ku, Saitama-shi 338-8570, Japan;
X-ray diffraction; low-energy electron diffraction (LEED) and reflection high-energy electron diffraction (RHEED); Ⅲ-Ⅴ and Ⅱ-Ⅵ semiconductors; molecular, atomic, ion, and chemical beam epitaxy;
机译:RF-MBE在YSZ(001)邻近衬底上生长立方InN薄膜
机译:钇稳定氧化锆(001)衬底上立方InN薄膜的RF-MBE生长和结构表征
机译:在MgO(001)邻近衬底上生长的立方GaN台阶结构和立方InN点阵列的生长温度依赖性
机译:ysz(001)ysz(001)的立方INN薄膜的RF-MBE成长
机译:Si(111)和MgO(001)表面上超薄铁膜的原子和电子结构
机译:MgO(001)衬底上的薄膜PdFe / VN和VN / PdFe双层薄膜的外延生长和超导性能
机译:mgO(001)衬底上外延Fe薄膜的单轴和立方各向异性的相互作用
机译:bcc过渡金属薄膜和超晶格在mgO(111),(011)和(001)衬底上的外延生长