首页> 美国卫生研究院文献>Beilstein Journal of Nanotechnology >Epitaxial growth and superconducting properties of thin-film PdFe/VN and VN/PdFe bilayers on MgO(001) substrates
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Epitaxial growth and superconducting properties of thin-film PdFe/VN and VN/PdFe bilayers on MgO(001) substrates

机译:MgO(001)衬底上的薄膜PdFe / VN和VN / PdFe双层薄膜的外延生长和超导性能

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摘要

Single-layer vanadium nitride (VN) and bilayer Pd Fe /VN and VN/Pd Fe thin-film heterostructures for possible spintronics applications were synthesized on (001)-oriented single-crystalline magnesium oxide (MgO) substrates utilizing a four-chamber ultrahigh vacuum deposition and analysis system. The VN layers were reactively magnetron sputtered from a metallic vanadium target in Ar/N plasma, while the Pd Fe layers were deposited by co-evaporation of metallic Pd and Fe pellets from calibrated effusion cells in a molecular beam epitaxy chamber. The VN stoichiometry and Pd Fe composition were controlled by X-ray photoelectron spectroscopy. In situ low-energy electron diffraction and ex situ X-ray diffraction show that the 30 nm thick single-layer VN as well as the double-layer VN(30 nm)/Pd Fe (12 nm) and Pd Fe (20 nm)/VN(30 nm) structures have grown cube-on-cube epitaxially. Electric resistance measurements demonstrate a metallic-type temperature dependence for the VN film with a small residual resistivity of 9 μΩ·cm at 10 K, indicating high purity and structural quality of the film. The transition to the superconducting state was observed at 7.7 K for the VN film, at 7.2 K for the Pd Fe /VN structure and at 6.1 K for the VN/Pd Fe structure with the critical temperature decreasing due to the proximity effect. Contrary to expectations, all transitions were very sharp with the width ranging from 25 mK for the VN film to 50 mK for the VN/Pd Fe structure. We propose epitaxial single-crystalline thin films of VN and heteroepitaxial Pd Fe /VN and VN/Pd Fe ( ≤ 0.08) structures grown on MgO(001) as the materials of a choice for the improvement of superconducting magnetic random access memory characteristics.
机译:在(001)取向的单晶氧化镁(MgO)衬底上利用四腔超高合成了单层氮化钒(VN)和双层Pd Fe / VN和VN / Pd Fe薄膜异质结构以用于可能的自旋电子学应用。真空沉积和分析系统。 VN层是在Ar / N等离子体中从金属钒靶反应性磁控溅射而成的,而Pd 通过在分子束外延室中从标定的积液池中共蒸发金属Pd和Fe颗粒,沉积Fe层。 VN化学计量和Pd 通过X射线光电子能谱控制Fe的组成。原位低能电子衍射和异位X射线衍射显示30 nm厚的单层VN以及双层VN(30 nm)/ Pd Fe(12 nm)和Pd Fe(20 nm) / VN(30 nm)结构已外延生长在立方体上。电阻测量结果表明,VN薄膜具有金属类型的温度依赖性,在10 K时残余电阻率为9μΩ·cm,这表明该薄膜具有较高的纯度和结构质量。对于VN膜,在7.7 K处观察到过渡到超导状态,对于Pd Fe / VN结构,在7.2 K处观察到,对于VN / Pd Fe结构在6.1 K处,由于接近效应,临界温度降低。与预期相反,所有过渡都非常尖锐,其宽度范围从VN膜的25 mK到VN / Pd Fe结构的50 mK。我们提出VN和异质外延Pd的外延单晶薄膜 铁/钒氮和钒氮/钯 在MgO(001)上生长的Fe(≤0.08)结构是改善超导磁性随机存取存储特性的一种选择材料。

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