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Impact of endurance degradation on the programming efficiency and the energy consumption of NOR flash memories

机译:耐久性下降对NOR闪存编程效率和能耗的影响

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In this paper the impact of the endurance degradation on the programming window and the energy consumption of flash floating gate memories is investigated. Using a new measurement technique we characterized the evolution of the dynamic drain current during the channel hot electron programming through the cycling. This experimental method has been developed for 90 nm technology node flash floating gate memories, but it is fully compatible with the highly scaled devices. We define the programming efficiency as a new figure of merit to evaluate the performances of flash memories and we demonstrate why this decreases during the cell aging. Moreover we confirm that the efficiency optimization point varies with the cell degradation. Finally, with a complete set of measurements, we show that our experimental protocol enables the understanding of the role of defects generation on the programming efficiency of NOR flash memories for embedded low energy applications.
机译:本文研究了耐久性下降对编程窗口和闪存浮栅存储器能量消耗的影响。使用新的测量技术,我们描述了通过循环进行通道热电子编程期间动态漏极电流的演变。已经针对90 nm技术节点闪存浮栅存储器开发了这种实验方法,但它与高度扩展的器件完全兼容。我们将编程效率定义为评估闪存性能的一个新指标,并说明了为什么在单元老化期间它会降低。此外,我们确认效率优化点随细胞降解而变化。最后,通过一整套测量,我们证明了我们的实验协议使我们能够了解缺陷生成对嵌入式低能耗应用NOR闪存编程效率的作用。

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