Mo/Si-multilayers for EUV applications prepared by Pulsed Laser Deposition (PLD)

摘要

In the past, the successful application of PLD for X-ray multilayer synthesis has already been demonstrated for C-spacer systems. Recently, the method has also been tested for Mo/Si layer stacks. A UHV-coating machine has been used to prepare X-ray mirrors on 4 in. Substrates. The ablation of both Mo and Si targets was carried out by Nd:YAG laser irradiation using the third harmonic (λ=355 nm) with a pulse energy E_p=275 mJ and a pulse with t=4...6 ns.