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Measurement of the thermal conductivity of nanometer scale thin films by thermoreflectance phenomenon

机译:利用热反射现象测量纳米级薄膜的热导率

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摘要

We have measured the temperature dependence of thermal conductivity up to several hundred degrees for memory device materials. In the measurement of thermal conductivity, we used a novel technique of nanosecond thermoreflectance measurement spectroscopy (Nano-TheMS) developed by Baba et al. The main advantage of this technique is that it can measure thin films of nanometer-order by easy sample preparation. Using this system with a heat stage, the measurement of thermal conductivities of Ge_2Sb_2Te_5 and ZnS-SiO_2, which were selected as representative materials of memory devices, from room temperature to 400 or 500℃ was carried out. All thermal conductivities increased with higher temperature. Using their temperature dependence, optical disk thermal simulation was carried out, and the results were compared with conventional calculated results without the dependence. It was found that the largest difference at maximum temperature was approximately 80℃. The temperature dependence of thermal properties is essential for realistic temperature simulation.
机译:我们已经测量了存储器件材料的热导率对温度的依赖性高达几百度。在热导率的测量中,我们使用了由Baba等人开发的纳秒热反射率测量光谱技术(Nano-TheMS)。该技术的主要优点是可以通过简单的样品制备来测量纳米级的薄膜。使用带有加热台的该系统,从室温到400或500℃对作为存储器件代表材料的Ge_2Sb_2Te_5和ZnS-SiO_2的导热率进行了测量。随着温度升高,所有热导率均增加。利用它们的温度依赖性,进行了光盘热模拟,并将结果与​​不具有依赖性的常规计算结果进行了比较。发现在最高温度下的最大差异约为80℃。热性能的温度依赖性对于实际的温度模拟至关重要。

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