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Thermal conductivity measurements of low-K films using thermoreflectance phenomenon

机译:利用热反射现象测量低K膜的热导率

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The thermal conductivity of low-dielectric-constant (low-k) materials has been studied by a nano second thermoreflectance measurement system (Nano-TheMS). The Nano-TheMS, which utilizes thermoreflectance, can easily measure the thermal conductivity of thin film of nano-meter scale thickness. We have measured a series of low-k film samples with varying methyl group content. The methyl group content is a significant factor in determining the dielectric constant and mechanical strength of low-k materials. We have also measured the temperature dependence of the thermal conductivity from room temperature to 300 ℃ as this dependence is essential to simulate realistic temperature distributions inside integrated devices. It was found that its dependence is not remarkable but the thermal conductivity gradually increase with rising temperature.
机译:低介电常数(low-k)材料的热导率已通过纳米秒热反射率测量系统(Nano-TheMS)进行了研究。利用热反射率的Nano-TheMS可以轻松测量纳米级厚度的薄膜的热导率。我们测量了一系列甲基含量不同的低k薄膜样品。甲基含量是决定低k材料介电常数和机械强度的重要因素。我们还测量了从室温到300℃的导热系数的温度依赖性,因为这种依赖性对于模拟集成器件内部的实际温度分布至关重要。发现其依赖性并不显着,但热导率随温度升高而逐渐增加。

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