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Effects of vacancy defects on graphene nanoribbon field effect transistor

机译:空位缺陷对石墨烯纳米带场效应晶体管的影响

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The graphene nanoribbon (GNR) field effect transistor is one of the most competitive candidates for beyond-CMOS nanoelectronics because of the special electric characteristics of graphene. During graphene preparation, vacancy defects are inevitably introduced and affect transistor performances. In this Letter, four typical vacancy defects in GNR (i.e. single vacancy, divacancy, Stone-Wales and 555 777 defects) are examined. By quantum-mechanics-based simulation, the effects of these four defects on the energy band of the GNR are analysed. Moreover, their effects on the performances of the GNR field effect transistor, such as transmission coefficient and transfer characteristics, are studied and compared for various defect locations in the channel.
机译:石墨烯纳米带(GNR)场效应晶体管是石墨烯的特殊电学特性,是超越CMOS纳米电子产品最有竞争力的候选之一。在石墨烯制备过程中,不可避免地会引入空位缺陷并影响晶体管性能。在这封信中,检查了GNR中的四个典型空缺缺陷(即单空缺,双空缺,Stone-Wales和555777缺陷)。通过基于量子力学的模拟,分析了这四个缺陷对GNR能带的影响。此外,针对沟道中的各种缺陷位置,研究并比较了它们对GNR场效应晶体管性能的影响,例如传输系数和传输特性。

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