机译:离子束辅助气体对离子束辅助溅射制备非晶硅薄膜结构的影响
Department of Chemical and Materials Engineering, Hefei College, Hefei City, 230601, P.R. China;
School of Economics and Management, Anhui Sanlian University, Hefei City, 230601, P.R. China;
Department of Chemical and Materials Engineering, Hefei College, Hefei City, 230601, P.R. China;
Department of Chemical and Materials Engineering, Hefei College, Hefei City, 230601, P.R. China;
Department of Chemical and Materials Engineering, Hefei College, Hefei City, 230601, P.R. China;
Department of Chemical and Materials Engineering, Hefei College, Hefei City, 230601, P.R. China;
Department of Chemical and Materials Engineering, Hefei College, Hefei City, 230601, P.R. China;
ion-beam-assisted gases; amorphous silicon thin films; structure; ion-beam-assisted sputtering;
机译:氢离子能量对离子束辅助溅射制备的a-Si:H薄膜结构的影响
机译:压缩磁场-磁控溅射氦气和氩气制备氢化非晶硅膜的耐热性
机译:铝制备的大晶粒多晶硅薄膜诱导溅射沉积的氢化非晶硅结晶
机译:使用离子束辅助电子束蒸发在非晶基板上沉积在非晶基板上的平面内纹理MgO薄膜的生长和结构
机译:非晶和纳米结构氢化硅薄膜的电子传输和噪声研究。
机译:前驱体C2H2分数对磁控溅射沉积制备的含Si和Ag的非晶碳复合膜的组织和性能的影响
机译:射频磁控溅射制备非晶硅碳薄膜中的电子传导过程
机译:通过液体外延和溅射制备的α和β碳化硅薄膜,