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Electrical properties study of double porous silicon layers: Conduction mechanisms

机译:双多孔硅层的电性能研究:导电机理

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摘要

The electrical conduction properties of a heterostructure based on a stacked double-layer porous silicon structure have been investigated. Two layers of porous silicon (PS) with different porosities were inserted in an Au/PS/p:Si/Al structure. Transport properties of this structure have been investigated by current-voltage (Ⅰ-Ⅴ) and admittance spectroscopy measurements. From Ⅰ-Ⅴ characteristics and the band diagram of the structure, it was concluded that tunneling current is prevailing at low forward polarization. The temperature dependence of the conductance shows the existence of a hopping conduction in the PS layer.
机译:已经研究了基于堆叠的双层多孔硅结构的异质结构的导电性能。将具有不同孔隙率的两层多孔硅(PS)插入Au / PS / p:Si / Al结构中。通过电流-电压(Ⅰ-Ⅴ)和导纳光谱法研究了该结构的输运性质。从Ⅰ-Ⅴ特性和结构的能带图可以得出结论,隧道电流在低正向极化时占主导地位。电导率的温度依赖性表明在PS层中存在跳跃导电性。

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