FINEMET-type thin films deposited by HiPIMS: Influence of growth and annealing conditions on the magnetic behaviour

摘要

Results concerning the influence of deposition conditions (effective power, P_(eff), pulse length, τ, and working gas pressure, p) as well as of thermal treatments on the properties of Fe_(73.5)Cu_1Nb_3Si_(15.5)B_7 thin films, deposited by high power impulse magnetron sputtering (HiPIMS) technique, are presented. The P_(eff), τ and p values were varied in the range of 30-90 W, 4-20 μs and 8-60 mTorr respectively. According to the XRD analysis, in as-deposited state, all the prepared samples are amorphous. For P_(eff) constant the coercive magnetic field, H_c, increases whit τ, while for τ constant H_c decreases when P_(eff) increases. The lowest H_c values have been obtained after the samples were annealed at temperatures between 450 C and 480 C, when the average size of the α-Fe(Si) grains and the crystalline volume fraction increase about 45% and 20% respectively.