APPARATUS FOR ANNEALING ELECTRON BEAM AND A METHOD FOR ANNEALING USING THE SAME, WHICH PERFORMS AN ANNEALING PROCESS WITH RESPECT TO A THIN FILM DEPOSITED ON A SUBSTRATE

摘要

PURPOSE: An apparatus for annealing electron beam and a method for annealing using the same are provided to perform an activation process without the damage of a thin film deposed on a substrate by injecting the electron beam toward the substrate with a pulse manner and subsequently injecting reaction gas.;CONSTITUTION: A substrate(120) is located within a chamber(110). A thin film(121) composed of a pre-set material is deposited on the substrate. An electron beam injecting unit(130) injects electronic beam into the pre-set area of the substrate in a pulse manner. A reaction gas is supplied to the inside of the chamber. A bias application unit(140) applies a bias voltage to the substrate.;COPYRIGHT KIPO 2010