Preparation and optical properties of epitaxial Pb(Mg_(1/3)Nb_(2/3))O_3 - PbTiO_3 thin film on Si substrates with buffer layer using pulsed laser deposition

摘要

Epitaxial Pb(Mg_(1/3)Nt_(2/3))O_3-PbTiO_3 (PMN-PT) thin films for electrooptic applications were fabricated on a Si substrate using buffer layers. The PMN-PT/SrRuO_3/SrTiO_3/(La,Sr)CoO_3/CeO_2 /YSZ/Si hetrostructure was fabricated by pulsed laser deposition A PMN-PT thin film with a thickness of 2μm was successfully deposited. The optical characteristics of PMN-PT epitaxial film were measured by prism coupling method. The morphology of the PMN-PT films was drastically improved by introducing a mask between the target and substrate during the deposition. The PMN-PT thin film showed a columnar structure, where the width of each column was approximately 180nm. A refractive index of 2.48 with zero bias voltage was obtained for the epitaxial PMN-PT thin film using the prism coupler method.