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Epitaxial growth and dielectric properties of BSZT thin films on SrTiO3 : NB single crystal substrate prepared by pulsed laser deposition

机译:脉冲激光沉积SrTiO3:NB单晶衬底上BSZT薄膜的外延生长和介电性能。

摘要

The (Ba0.75Sr0.25)(Zr0.25Ti0.75)O3 (BSZT) thin films were grown on (100) SrTiO3:1.0wt.% Nb single crystal substrates by pulsed laser deposition. Highly (001)-oriented BSZT films were achieved. The thickness of as-grown thin films was measured by a surface profiler and was found to be ~600nm. The crystalline structure of the BSZT thin films on (100) SrTiO3:Nb substrate was analyzed by an X-ray diffractometer (XRD). The surface morphology and roughness were determined by an atomic force microscopy (AFM) using tapping mode amplitude modulation. The films exhibited a clustered grains characteristic of the grains with size of 80-120nm. The dielectric properties of Pt/BSZT/SrTiO3:Nb capacitors were measured by using an Agilent 4294A impedance analyzers at room temperature. The dielectric constant of BSZT film changes significantly with applied dc bias field and has a high tunability of ~44% at an applied field of 600kV/cm.
机译:(Ba0.75Sr0.25)(Zr0.25Ti0.75)O3(BSZT)薄膜通过脉冲激光沉积在(100)SrTiO3:1.0wt。%Nb单晶衬底上生长。获得了高度(001)取向的BSZT薄膜。生长的薄膜的厚度通过表面轮廓仪测量,发现为〜600nm。通过X射线衍射仪(XRD)分析了(100)SrTiO3:Nb衬底上的BSZT薄膜的晶体结构。表面形态和粗糙度通过原子力显微镜(AFM)使用攻丝模式振幅调制来确定。膜表现出具有80-120nm尺寸的晶粒的簇状晶粒特征。通过在室温下使用Agilent 4294A阻抗分析仪测量Pt / BSZT / SrTiO3:Nb电容器的介电性能。 BSZT薄膜的介电常数随所施加的直流偏置电场而发生显着变化,并且在600kV / cm的施加电场下具有〜44%的高可调性。

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