机译:用于氧化锌和氮化镓的电子束光刻的基于聚噻吩的电荷耗散层
Department of Electronics and Electrical Engineering, University of Glasgow, Rankine Building,Oakfleld Avenue, Glasgow G12 8LT, United Kingdom;
rnFaculty of Microsystem Electronics and Photonics, Wroclaw University of Technology,ul. Janiszewskiego 11/17, 50-372 Wroclaw, Poland;
rnDepartment of Electronics and Electrical Engineering, University of Glasgow, Rankine Building,Oakfleld Avenue, Glasgow G12 8LT, United Kingdom;
rnDepartment of Electronics and Electrical Engineering, University of Glasgow, Rankine Building,Oakfleld Avenue, Glasgow G12 8LT, United Kingdom;
机译:用于氧化锌和氮化镓的电子束光刻的基于聚噻吩的电荷耗散层
机译:基于导电聚合物的电荷散逸层,用于本体氧化锌的电子束构图
机译:基于导电聚合物的电荷散逸层,用于本体氧化锌的电子束构图
机译:PMMA电子束光刻电荷耗散层对透明绝缘基板的剂量敏感性的比较诸如GaN的透明绝缘基板
机译:氧化锌发光二极管,氧化铟锌薄膜晶体管和氮化铝镓/氮化镓高电子迁移率晶体管基生物传感器的制造与表征。
机译:第一性原理晶格动力学获得的纤锌矿型氧化锌的导热系数–与氮化镓的比较研究
机译:通过电子束光刻在衬底上沉积氮化镓薄膜