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首页> 外文期刊>Journal of Electronic Materials >Inteqration of GaN Thin Films with Dissimilar Substrate Materials by Pd-In Metal Bonding and Laser Lift-off
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Inteqration of GaN Thin Films with Dissimilar Substrate Materials by Pd-In Metal Bonding and Laser Lift-off

机译:通过Pd-In金属键合和激光剥离实现GaN薄膜与异质衬底材料的结合

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摘要

Gallium nitride (GaN) thin films grown on sapphire substrates were successfully bonded and transferred onto GaAs, Si, and polymer "receptor" substrates using a low-temperature Pd-In bond followed by a laser lift-off(LLO) process to remove the sapphire growth substrate. The GaN/sapphire structures were joined to the receptor substrate by pressure bonding a Pd-In bilayer coated GaN surface onto a Pd coated receptor substrate at a temperature of 200 deg.C. X-ray diffraction showed that the intermetallic compound PdIn_3, had formed during the bonding process. LLO, using a single 600 mJ/cm~2, 38 ns XiF (248 nm) excimer laser pulse directed through the transparent sapphire substrate, followed by a low-temperature heat treatment, completed the transfer of the GaN onto the "receptor" substrate. Cross-sectional scanning electron microscopy and x-ray rocking curves showed that the film quality did not degrade significantly during the bonding and LLO process.
机译:使用低温Pd-In键和激光剥离(LLO)工艺成功去除在蓝宝石衬底上生长的氮化镓(GaN)薄膜,并将其成功转移到GaAs,Si和聚合物“受体”衬底上。蓝宝石生长衬底。通过在200℃的温度下将Pd-In双层涂覆的GaN表面压力结合到Pd涂覆的受体衬底上,将GaN /蓝宝石结构连接到受体衬底。 X射线衍射表明在结合过程中形成了金属间化合物PdIn_3。 LLO使用单个600 mJ / cm〜2、38 ns XiF(248 nm)准分子激光脉冲穿过透明蓝宝石衬底,然后进行低温热处理,从而完成了GaN在“受体”衬底上的转移。截面扫描电子显微镜和X射线摇摆曲线表明,在粘合和LLO过程中膜的质量没有明显降低。

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