首页> 外文期刊>Journal of Crystal Growth >A forbidden temperature region for the growth of planar strained InAlGaAs MQW structures for 1.3*um lasers
【24h】

A forbidden temperature region for the growth of planar strained InAlGaAs MQW structures for 1.3*um lasers

机译:用于1.3 * um激光器的平面应变InAlGaAs MQW结构生长的禁止温度区域

获取原文
获取原文并翻译 | 示例
       

摘要

Compressively strained MQW InAlGaAs laser structures have been grown on [100] sulfur-doped InP substrates using digital alloy molecular beam epitaxy at temperatures in the range 480-585℃. In the limited temperature interval ~520-555℃ quantum wells with ~1.4% compressive strain become non-planar, and their photoluminescence emission spectra broaden significantly. AFM measurements show that this is due to the formation of quantum dashes. Their effect upon the material characteristics and subsequent device performance is presented and discussed.
机译:压缩应变的MQW InAlGaAs激光结构已在[100]掺硫InP衬底上使用数字合金分子束外延在480-585℃的温度下生长。在〜520-555℃的有限温度区间内,压缩应变为〜1.4%的量子阱变为非平面,其光致发光发射光谱显着扩宽。原子力显微镜的测量表明,这是由于量子破折号的形成。提出并讨论了它们对材料特性和后续器件性能的影响。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号